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Recent Posts

  • Through substrate vias: opportunities for CMOS MEMS and 3D integration
  • MEMS foundry IMT appoints new CEO
  • Automotive MEMS components: the impact of 2011 natural disasters
  • MEMS foundry Silex joins $17.5 million program to develop RF solutions for 4G mobile systems
  • Magnetics and MEMS: trends, opportunities and emerging applications
  • ST launches world's first dual-core MEMS gyro
  • Tronics to manufacture RF MEMS switches for DelfMEMS
  • MEMS and venture capital: lessons learned from Ardesta's portfolio companies
  • Magnetic sensors in automotive motors to enjoy brisk growth
  • Gentex acquires MEMS motion sensor maker InterSense

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Overview of CMP technologies for MEMS applications

110109Rhoades_photo CMP, or chemical mechanical polishing, was developed in the late 1980s at least partially as a result of a secret IBM project at the time.  Although initially mainly used in CMOS processes, CMP is now increasingly being utilized by MEMS process flows.  We recently spoke with Dr. Robert Rhoades, CTO of Entrepix, about the history of CMP, current trends as well as traditional and emerging CMP MEMS applications.  In this  comprehensive interview, Robert also provides his insights on the current CMP cost trends and the emerging 3D stacking and TSV technologies.

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January 13, 2011 at 04:47 PM | Permalink | Comments (0)

MEMS foundry IMT adds to its arsenal of through silicon via offerings

101209 IMT logo Innovative Micro Technology (IMT) announced this week the addition of a new geometry point in its technology roadmap for through silicon vias (TSVs).  Joining the copper-filled 15 by 60 micron depth TSV configuration that has been in production for nearly 2 years, IMT has been sampling its 50 by 250 micron copper-filled TSV which is planned for production shortly after the first of the year.

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December 09, 2010 at 11:19 AM | Permalink | Comments (0)

Overview of wafer level packaging technology for MEMS applications

by Michael Shillinger
Vice President of Operations, Innovative Micro Technology

101118 MShillinger photo Wafer level packaging (WLP) technology offers protection of delicate MEMS structures from ambient environment, providing improved reliability, performance, and reduced cost benefits to meet real world requirements.  In simple terms, WLP consists of bonding a cap or a lid wafer on top of a MEMS wafer.  While aspects of WLP can be modular, some customization is necessary to meet the needs of each application, where such variables include device footprint, temperature budget, allowable materials, hermeticity, absolute pressure, and cost.  WLP technology is now widely used in the MEMS industry, and has contributed to mainstream acceptance of MEMS.

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November 18, 2010 at 10:12 PM | Permalink | Comments (1)

Lilliputian, Intel to partner on manufacturing

101118 Lilliputian logo Lilliputian Systems, developer of a MEMS based portable power solution for consumer electronics devices, announced that it has signed a wafer manufacturing supply agreement with Intel.  Additionally, Lilliputian announced that Intel Capital has taken an equity stake in Lilliputian Systems.  "Intel recognizes that portable power solutions will be essential to consumer electronics devices and is committed to manufacturing Lilliputian's technology," said Brian Krzanich, SVP and GM of Manufacturing and Supply Chain for Intel Corporation.

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November 16, 2010 at 06:15 PM | Permalink | Comments (0)

Overview of glass micro machining processes for MEMS applications

by Dave Sarvela
Manager of Applied Technology, IKONICS Corporation

101109 Dave Sarvela photo portrait Glass is often considered a more desirable material for particular MEMS device applications due to its unique properties, such as optical transparency and biological compatibility.

As the desire to use glass in the MEMS industry increases, so does the need to develop better methods to micro-machine this material.  Traditional machining methods, such as CNC, are not very effective at machining brittle materials such as glass.  In addition, as the diversity of MEMS applications expands, the desired features continue to get smaller, denser and more intricate.

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November 11, 2010 at 07:40 PM | Permalink | Comments (2)

MEMS foundry Advanced MicroSensors to be acquired by Plures Technologies

101109 AMS logo Plures Technologies is in the final phase of acquiring and recapitalizing Advanced MicroSensors (AMS), an established high volume MEMS fabrication facility.  AMS offers a complete suite of MEMS processing capabilities and specific expertise in the use of magnetic films for MEMS and other applications.

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November 11, 2010 at 04:44 PM | Permalink | Comments (0)

Industry overview: a MEMS foundry perspective

101014 Nancy Fares photo small As the MEMS marketplace continues to evolve at a rapid pace, many new and exciting trends are taking shape.  To provide some perspective, we recently spoke with Nancy Fares, Micralyne’s new President and CEO.  In this detailed interview, Nancy provides unique insights on the main current trends in the MEMS marketplace, venture capital, most promising MEMS startups as well as potential future “killer apps” for MEMS technologies.

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October 14, 2010 at 07:43 PM | Permalink | Comments (0)

MEMS foundry DALSA to expand R&D investment

101014 DALSA logo DALSA Corporation, a manufacturer of digital imaging, MEMS and semiconductor components, announced this week that it plans to invest $160 million in new research and development initiatives over the next five years, supported by a grant of up to $24.3 million from the Ontario provincial government.

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October 14, 2010 at 06:07 PM | Permalink | Comments (0)

MEMS foundry ISSYS announces manufacturing expansion

101007 ISSYS logo Integrated Sensing Systems, Inc. (ISSYS) announced that it has completed its 2010 manufacturing expansion project, adding 5,400 square feet to its existing facility.  The expansion is dedicated to manufacturing of system-level products based on ISSYS MEMS chips that are fabricated in its current cleanroom facility.  The expansion includes assembly lines, production laboratories, clean assembly and packaging rooms as well as calibration areas for both medical and industrial products.  The new floor space also includes a combination cleanroom and Faraday cage for final assembly and calibration area with capacity for over 10,000 units per year of ISSYS' wireless, batteryless medical implants.  The company’s fabrication facilities are located near Ann Arbor, Michigan.

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October 07, 2010 at 11:26 PM | Permalink | Comments (0)

Groups partner on TSV process development for 3D MEMS and IC integration

EV Group (EVG), a supplier of wafer bonding equipment for the MEMS, nanotechnology and semiconductor markets, and the Institute of Microelectronics (IME), a research institute of the Agency for Science, Technology and Research (A*STAR), announced that they have entered into a two-year cooperation agreement to advance 3D IC integration technologies.  By minimizing interconnect length, 3D IC integration offers more flexibility in the designs and can operate at higher clock rates and consume less power.  The development in 3D IC also significantly simplifies chip-to-chip communications and the data transfer among the processing elements, enabling faster signal and data throughput so that high-frequency and high-transfer rates can be achieved.

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July 08, 2010 at 10:24 PM | Permalink | Comments (0)

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